X-Ray Photoelectron Spectroscopy (XPS)
X-ray photoelectron spectroscopy (XPS) is a powerful analytical technique used to examine the surface of materials, providing valuable insights into both elemental and chemical composition. XPS is extremely surface sensitive — it measures approximately the top 10 nanometers of the surface of the sample. This surface specificity, combined with the ability to quantify the chemical composition of the surface, makes XPS extremely useful for materials analysis.
XPS Instruments
K-Alpha
K-Alpha XPS System introduces a fresh approach to surface analysis. It offers a streamlined workflow and user-friendly operation while maintaining high-quality results and advanced capabilities.
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- High-throughput XPS
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- Fast, efficient, automated workflow
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- Ion source for depth profiling
Nexsa G2
Nexsa G2 XPS System offers fully automated, high-throughput surface analysis. It integrates XPS with ion scattering spectroscopy (ISS), UV photoelectron spectroscopy (UPS), reflected electron energy loss spectroscopy (REELS), and Raman spectroscopy for true correlative analysis. With options for sample heating and biasing, it expands the range of possible experiments
- - High-performance XPS
- - Integrated multi-technique option
- - Optional dual-mode ion source for monoatomic and cluster ion depth profiling
ESCALAB QXi
ESCALAB QXi XPS Microprobe is a highly flexible and configurable multi-technique instrument sensitivity and rapid production of high-quality spectra
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- High spectral resolution
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- Multi-technique surface analysis as standard
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- Extensive sample preparation and expansion options
